Impurities Workshop - Part III: Elemental Impurities

Impurities Workshop - Part III:   Elemental Impurities

Heidelberg, Germany

Course No 15497


Costs

This conference already took place.

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Speakers

DR CORINA NACHTSHEIM, Quality Assessor, Germany
DR GISELA FONTAINE, Solvias AG, Switzerland
DR GERD JILGE, Boehringer Ingelheim Pharma GmbH & Co. KG, Germany
DR SAMUEL POWELL, Pfizer, United Kingdom
DR ULRICH ROSE, Strasbourg, France
DR XAVER SCHRATT, LPU Labor für Pharma- und Umweltanalytik GmbH, Germany
DR ANDREW TEASDALE, AstraZeneca, United Kingdom

Objectives

In Part III of the Impurities Forum the key principles of the new ICH Q3D Guideline will be highlighted. You will get to know the essential aspects and approaches of determining and controlling elemental impurities in drug products. You will learn
which are the principles of the elemental impurities risk assessment process,
factors that affect the limits – route of administration and also duration of exposure,
how to implement risk-based strategies to control elemental impurities,
which analytical methods are suitable to determine,
elemental impurities and what you have to consider when you apply them,
what you need in your QC lab to be prepared for elemental impurities analytics.

Background

In November 2014, the ICH Q3D Guideline for Elemental Impurities was published as Step 4 document. This document outlines
the evaluation of the toxicity data for potential elemental impurities,
the PDEs for each element of toxicological concern,
the basis for an EI risk assessment and the key factors for evaluation,
the development of controls designed to limit the inclusion of elemental impurities in drug products to levels at or below the PDE.

In March 2015 USP announced a revision to General Notices section 5.60.30 Elemental Impurities in USP Drug Products and Dietary Supplements, establishing 1 January 2018 as the new date of applicability of General Chapters <232> Elemental Impurities-Limits and <2232> Elemental Contaminants in Dietary Supplements. In November 2015 the European Pharmacopoeia adopted the deletion of the test for heavy metals (2.4.8) from approx. 760 individual monographs on substances for pharmaceutical use (except substances for veterinary use only).

Target Group


The conference addresses all personnel involved in development of drug substances and drug products from scientific staff to laboratory heads involved in R&D. The needs of Laboratory Managers, Supervisors and Analysts in pharmaceutical quality assurance and quality control departments will also be covered.

Programme

Implementation of ICH Q3D in the European Pharmacopoeia
History of heavy metals tests
General texts on elemental impurities in Ph. Eur.
Implementation strategy for Ph. Eur. after adoption of ICH Q3D

Analytical methods to determine metallic impurities
Principles and characteristics of the most common spectrometric techniques AAS, ICP-OES, ICP-MS
Compound methods (sample preparation plus spectrometric detection and quantification)
Special considerations for trace-elemental analysis
Application-based approach for choice of methodology
Analytical process (method development, validation strategy, routine testing)

Control Strategies for Elemental Impurities in final dosage forms – Case studies
Utilisation of Data as part of an Integrated EI Risk Assessment Process
Potential Sources of Elemental Impurities in the Finished Product
- API
- Equipment
- Container-closure system
- Excipients
Conclusions

Workshop: Conducting a risk assessment
In this Workshop the participants will work on several case studies and perform a risk assessment for different scenarios taking into account e.g. manufacturing equipment, dosage form of the drug product etc.

QC lab infrastructure and equipment for metal impurities analytics
Process-oriented laboratory design
Basic components of a trace elemental laboratory
Approaches for contamination control
Handling of highly active pharmaceutical compounds in a trace elemental laboratory: operator protection versus product protection?
Accessories for interference control in ICP-MS

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